Stemmer Research Group

Our research efforts focus on functional oxide thin films and advanced structural characterization techniques:

* High-k gate dielectrics for silicon CMOS and III-V channels: Talk at 2007 ULSI/TFT Conference, Barga; paper on gate dielectric stability on silicon;

* Electric Field Tunable Thin Films: Talk at Ferroelectrics UK 2006.

* Scanning transmission electron microscopy: Talk at FEMMS 2007.

* Oxide MBE (under construction)

Research support:

Department of Energy, Basic Energy Sciences

Semiconductor Research Corporation Nonclassical CMOS Research Center: see article in UCSB's Convergence Magazine (summer 2007)

National Science Foundation

Office of Naval Research

Petroleum Research Fund