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Intern: Gurminder Sangha, CSU Fresno Mentor: Jon Burnsed Faculty Supervisor: Dr. Roy Smith Department: Electrical & Computer Engineering

MOCVD MONITOR AND PROCESS CONTROL

Metal Organic Chemical Vapor Deposition (MOCVD) is a process used to grow single crystal on an existing template crystal known as a substrate. Monitoring growing film properties such as temperature, composition, thickness, growth rate, and surface smoothness in real time would be extremely helpful to improve the quality of semiconductor film. I used Lab-VIEW and MATLAB to process the data acquired using LASER, DAQ Pad, and lock-in-amplifier (major components of the MOCVD monitor). MOCVD monitor record the sinusoidal variation in reflection caused by interference (constructive and destructive) effects of a growing thin film. MATLAB is then used to find the frequency of oscillation of the growing film and its growth rate.

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