Outreach Programs

Education Programs Technology Outreach Program International Programs Distinguished Lecturer Series International Center for Materials Research MRL Diversity Fellowship MRL Travel Fellowship

Intern: Paul-Henri Coulard, UCSB Mentor: Frederic Diana Faculty Supervisor: Pierre Petroff Department: Materials

LARGE-AREA NANO-PATTERNED TEMPLATES FABRICATION AND TRANSFER USING NANO-IMPRINT LITHOGRAPHY

The main objective of this project is the processing of “nano-patterned” substrates, via a modern and developing technology: Nano-Imprint Lithography (NIL). In NIL, a thin layer of a thermoplastic polymer (on top of a Si or GaAs substrate) is imprinted by a master stamp to give a negative surface topography. This process can be repeated several times to give a very large patterned surface area. By using chemical etching or Reactive Ion Etching, the pattern is transferred into the underlying Si or GaAs substrate. Finally, the remaining polymer is removed. But before using NIL, master templates or master stamps have to be realized. To do so, a new technique was developed in collaboration between Prof. P. Petroff group at UCSB and Prof. J. Heath group at UCLA. In this technique, superlattices of GaAs and AlGaAs are grown by Molecular Beam Epitaxy before being cleaved and selectively etched. It allows the fabrication of arrays of nanolines (nanolines typically 1 cm in length and 10 – 50 nm in width).

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